![Planar Magnetron Sputter Cathodes | High Utilization | High Uniformity | Magnetic Material Sputtering | DC, RF, AC, Bipolar | Integrated Gas Distribution Magnetron | PVD Magnetron Planar Magnetron Sputter Cathodes | High Utilization | High Uniformity | Magnetic Material Sputtering | DC, RF, AC, Bipolar | Integrated Gas Distribution Magnetron | PVD Magnetron](https://www.intellivation.com/wp-content/uploads/2019/12/Dual-Magnetron-Sputtering.png)
Planar Magnetron Sputter Cathodes | High Utilization | High Uniformity | Magnetic Material Sputtering | DC, RF, AC, Bipolar | Integrated Gas Distribution Magnetron | PVD Magnetron
![Analysis of magnetic field distribution in a cylindrical-type magnetron sputtering system - Kang-Yul Bae, Young-Soo Yang, Bum-Ho Choi, 2013 Analysis of magnetic field distribution in a cylindrical-type magnetron sputtering system - Kang-Yul Bae, Young-Soo Yang, Bum-Ho Choi, 2013](https://journals.sagepub.com/cms/10.1177/0954405413477854/asset/images/large/10.1177_0954405413477854-fig1.jpeg)
Analysis of magnetic field distribution in a cylindrical-type magnetron sputtering system - Kang-Yul Bae, Young-Soo Yang, Bum-Ho Choi, 2013
![Planar Magnetron Sputter Cathodes | High Utilization | High Uniformity | Magnetic Material Sputtering | DC, RF, AC, Bipolar | Integrated Gas Distribution Magnetron | PVD Magnetron Planar Magnetron Sputter Cathodes | High Utilization | High Uniformity | Magnetic Material Sputtering | DC, RF, AC, Bipolar | Integrated Gas Distribution Magnetron | PVD Magnetron](https://www.intellivation.com/wp-content/uploads/2019/12/Magnetron-Sputtering.png)